荧光成像技术无损探测光学元件亚表面缺陷

刘红婕; 王凤蕊; 耿峰; 周晓燕; 黄进; 叶鑫; 蒋晓东; 吴卫东; 杨李茗

doi:10.3788/OPE.20202801.0050

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荧光成像技术无损探测光学元件亚表面缺陷

现代应用光学 | 更新时间：2020-08-13

- 荧光成像技术无损探测光学元件亚表面缺陷
- Nondestructive detection of optics subsurface defects by fluorescence image technique
- 光学精密工程 2020年28卷第1期页码：50-59
- 作者机构：
  
  中国工程物理研究院激光聚变研究中心，四川绵阳 621900
- 作者简介：
  
  [ "刘红婕(1978-)，女，山东鄄城人，硕士，高级工程师，2005年于中国工程物理研究院北京研究生部获得硕士学位，主要从事高功率激光光学元件特性的研究。E-mail:hongjie3713@163.com" ]
- 基金信息：
  
  等离子体物理国家重点实验室基金资助项目(6142A0403010417);国家自然科学基金资助项目(11704352)
- DOI：10.3788/OPE.20202801.0050
  中图分类号： O433.2;TN247
- 收稿日期：2019-04-03，
  
  录用日期：2019-5-19，
  
  纸质出版日期：2020-01-25
- 稿件说明：
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刘红婕, 王凤蕊, 耿峰, 等. 荧光成像技术无损探测光学元件亚表面缺陷[J]. 光学精密工程, 2020,28(1):50-59.

Hong-jie LIU, Feng-rui WANG, Feng GENG, et al. Nondestructive detection of optics subsurface defects by fluorescence image technique[J]. Optics and precision engineering, 2020, 28(1): 50-59.
刘红婕, 王凤蕊, 耿峰, 等. 荧光成像技术无损探测光学元件亚表面缺陷[J]. 光学精密工程, 2020,28(1):50-59. DOI： 10.3788/OPE.20202801.0050.

Hong-jie LIU, Feng-rui WANG, Feng GENG, et al. Nondestructive detection of optics subsurface defects by fluorescence image technique[J]. Optics and precision engineering, 2020, 28(1): 50-59. DOI： 10.3788/OPE.20202801.0050.

摘要

为了建立有效无损的亚表面缺陷探测技术，本文开展了光学元件亚表面缺陷的荧光成像技术研究，通过系统优化激发波长、成像光谱、成像光路及探测器等影响探测精度和探测灵敏度的参数，研制出小口径荧光缺陷检测样机。基于该样机对一系列精抛光熔石英和飞切KDP晶体元件的散射缺陷和荧光缺陷进行了表征，获得了各类样品亚表面缺陷所占的比重差异很大，从0.012%到1.1%不等。利用统计学方法分析了亚表面缺陷与损伤阈值的关系，结果显示，熔石英亚表面缺陷与损伤阈值相关曲线的

值为0.907，KDP晶体亚表面缺陷与损伤阈值相关曲线的

值为0.947

均属于强相关。该研究结果可评价光学元件的加工质量，用于指导紫外光学元件加工工艺，并且由于该探测技术具有无损、快速的特点，因此可应用于大口径紫外光学元件全口径亚表面缺陷探测，具有极其重要的工程意义。

Abstract

To establish an effective and nondestructive subsurface defects detection technology

the fluorescence image technique of optics subsurface defect was studied. A small-aperture fluorescent defect-detection prototype was developed by systematically optimizing various parameters such as the excitation wavelength

imaging spectrum

imaging light path

and the detector. Based on the prototype

the surface and subsurface fluorescence defects of the finishing processing of fused silica and diamond fly-cutting processing KDP were characterized. The laser-induced damage threshold was measured by a 351-nm nanosecond pulsed laser. There is a significant difference in the subsurface defects of various samples

ranging from 0.012% to 1.1%. The relationship between the subsurface defects and the damage threshold was analyzed by statistical methods. The results show that the

value of the fused silica subsurface defect and the damage threshold curve is 0.907

and the

value of the KDP crystal subsurface defect and the damage threshold correlation curve is 0.947; both are strongly related. The results can be used to evaluate the processing quality of the optical components.Because of its nondestructive and short duration characteristics

the technique can be applied to the detection of full-area subsurface defects in large-dimension UV optical components

which makes it vital in engineering.

关键词

Keywords

references

MOSES E I, CAMPBELL J H, STOLZ C J, et al .. The national ignition facility: the world's largest optics and laser system[J]. SPIE , 2003, 5001:1-15.

MOSES E I. National ignition facility: 1.8 MJ, 750 TW ultraviolet laser[J]. SPIE , 2004, 5341: 13-24.

ANDRE M L. Status of the LMJ project[J]. SPIE , 1996, 3047: 38-42.

PENG H S, ZHANG X M, WEI X F, et al .. Design of 60-kJ SG-Ⅲ laser facility and related technology development[J]. SPIE , 2001, 4424: 98-103.

XIAO G Y, FAN D Y, WANG S J, et al .. SG-Ⅱ solid-state laser ICF system[J]. SPIE , 1998, 3492: 890-895.

CAMP D M, KOZLOWSKI M R, SHEEHAN L M, et al .. Subsurface damage and polishing compound affect the 355 nm laser damage threshold of fused silica surfaces[R].UCRL-JC-129301, 1997.

GÉNIN F Y, SALLEO A, PISTOR T V, et al .. Role of light intensification by cracks in optical breakdown on surfaces[J]. Journal of the Optical Society of America A , 2001, 18(10): 2607-2616.

YANG M H, QI H J, ZHAO Y N, et al .. Reduction of the 355-nm laser-induced damage initiators by removing the subsurface cracks in fused silica [J]. SPIE , 2011, 8206: 82061C-1-7.

NEAUPORT J, CORMONT P, LAMAIGNÈRE L, et al .. Concerning the impact of polishing induced contamination of fused silica optics on the laser-induced damage density at 351 nm[J]. Optics Communications, 2008, 281(14): 3802-3805.

LIU H J, HUANG J, YE X, et al .. Residual impurities on fused silica surface processed by different technics and their effects on laser induced damage at 355 nm [J]. Optoelectron. Adv. Mater., 2015, 17:1406-1410.

LIU H J, YE X, ZHOU X D, et al .. Subsurface defects characterization and laser damage performance of fused silica optics during HF-etched process [J]. Optical Materials , 2014, 36(5): 855-860.

LIU H J, HUANG J, WANG F R, et al .. Subsurface defects of fused silica optics and laser induced damage at 351 nm[J]. Optics Express , 2013, 21(10): 12204-12217.

NEAUPORT J, AMBARD C, CORMONT P, et al .. Subsurface damage measurement of ground fused silica parts by HF etching techniques[J]. Optics Express , 2009, 17(22): 20448-20456.

SURATWALA T, WONG L, MILLER P, et al .. Sub-surface mechanical damage distributions during grinding of fused silica[J]. Journal of Non-Crystalline Solids , 2006, 352(52/53/54): 5601-5617.

ZHOU Y Y, FUNKENBUSCH P D, QUESNEL D J, et al .. Effect of etching and imaging mode on the measurement of subsurface damage in microground optical glasses[J]. Journal of the American Ceramic Society , 1994, 77(12): 3277-3280.

MENAPACE J A, DAVIS P J, STEELE W A, et al .. MRF applications: measurement of process-dependent subsurface damage in optical materials using the MRF wedge technique[R]. UCRL-PROC-217271, 2005.

刘健, 马占龙, 王君林, 等.光学元件亚表面损伤检测技术研究现状[J].激光与光电子学进展, 2011, 48:081204.

LIU J, MA ZH L, WANG J L, et al .. Research status of subsurface damage detection technology of optical elements[J] . Laser & Optoelectronics Progress, 2011, 48:081204. (in Chinese)

田爱玲, 党娟娟, 王春慧, 等.光学元件亚表层损伤检测和规律研究[J].西安工业大学学报, 2011, 31(4):24-28.

TIAN A L, DANG J J, WANG CH H, et al .. Optical subsurface damage detection and its analysis[J]. Journal of Xi'an Technological University, 2011, 31(4):24-28. (in Chinese)

FÄHNLE O, WONS T, KOCH T, et al .. ITIRM as a tool for qualifying polishing processes [J]. Appl. Opt., 2002, 41: 4036-4038.

WUTTIG A., STEINERT J, DUPARRE A. et al .. Surface roughness and subsurface damage characterization of fused silica substrates[J]. SPIE , 1999, 3739: 369-376.

MA B, SHEN Z X, HE P F, et al .. Detection of subsurface defects of fused silica optics by confocal scattering microscopy [J]. Chinese Optics Letters, 2010, 8(3):296-299.

程健, 王景贺, 张培月, 等.熔石英元件HF刻蚀的实验研究[J].强激光与粒子束, 2017, 29(11): 8-14.

CHENG J, WANG J H, ZHANG P Y, et al .. Experimental study on HF etching of fused silica[J]. High Power Laser and Particle Beams , 2017, 29(11): 8-14. (in Chinese)

朱耀楠, 麦绿波, 刘庆明, 等.光学表面激光损伤阈值测试方法第1部分: 1对1测试. GB/T 16601-1996[S].国家技术监督局, 1996.

ZHU Y N, MAI L B, LIU Q M et al .., Test methods for laser induced damage threshold of optical surfaces.Part 1: 1 on 1 test, GB/T 16601-1996[S]. National Technology Supervision Bureau, 1996. (in Chinese)

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