大高宽比硬X射线波带片制作及聚焦测试

李海亮; 史丽娜; 牛洁斌; 王冠亚; 谢常青

doi:10.3788/OPE.20172511.2803

您当前的位置：

首页 >

文章列表页 >

大高宽比硬X射线波带片制作及聚焦测试

X射线光学 | 更新时间：2020-07-07

- 大高宽比硬X射线波带片制作及聚焦测试
- Fabrication and focusing test of hard X-ray zone plates with high aspect ratio
- 光学精密工程 2017年25卷第11期页码：2803-2809
- 作者机构：
  
  1.中国科学院微电子研究所微电子器件与集成技术重点实验室, 北京 100029
  2.中国科学院大学, 北京 100049
- 作者简介：
  
  [ "李海亮(1984-), 男, 河南焦作人, 博士研究生, 主要从事高线密度衍射光学元件研制、电子束光刻和X射线光刻等方面的研究。E-mail:lihailiang@ime.ac.cn" ]
  谢常青(1971-), 男, 广西钦州人, 研究员, 1993年于中国科技大学获得学士学位, 主要从事X射线衍射光学器件的研究。E-mail:xiechangqing@ime.ac.cn XIE Chang-qing, E-mail:xiechangqing@ime.ac.cn
- 基金信息：
  
  应用光学国家重点实验室开放基金资助项目(Y6YS053001);国家自然科学基金资助项目(61275170)
- DOI：10.3788/OPE.20172511.2803
  中图分类号： TN305.7
- 收稿日期：2017-03-20，
  
  录用日期：2017-4-15，
  
  纸质出版日期：2017-11-25
- 稿件说明：
移动端阅览
李海亮, 史丽娜, 牛洁斌, 等. 大高宽比硬X射线波带片制作及聚焦测试[J]. 光学精密工程, 2017,25(11):2803-2809.

Hai-liang LI, Li-na SHI, Jie-bin NIU, et al. Fabrication and focusing test of hard X-ray zone plates with high aspect ratio[J]. Optics and precision engineering, 2017, 25(11): 2803-2809.
李海亮, 史丽娜, 牛洁斌, 等. 大高宽比硬X射线波带片制作及聚焦测试[J]. 光学精密工程, 2017,25(11):2803-2809. DOI： 10.3788/OPE.20172511.2803.

Hai-liang LI, Li-na SHI, Jie-bin NIU, et al. Fabrication and focusing test of hard X-ray zone plates with high aspect ratio[J]. Optics and precision engineering, 2017, 25(11): 2803-2809. DOI： 10.3788/OPE.20172511.2803.

摘要

为得到同步辐射光源硬X射线波段（＞2 keV）需要的高宽比高分辨率波带片，本文利用高加速电压（100 kV）电子束光刻配合Si

镂空薄膜直写来减少背散射的方法，对硬X射线波带片制作技术进行了蒙特卡洛模拟和电子束光刻实验。模拟结果显示：Si

镂空薄膜衬底可以有效降低电子在抗蚀剂中传播时的背散射，进而改善高密度大高宽比容易引起的结构倒塌和粘连问题。通过调整电子束的曝光剂量，在500 nm厚的镂空Si

薄膜衬底上制备出最外环宽度为150 nm、金吸收体的厚度为1.6 μm，高宽比大于10的硬X射线波带片。同时，引入随机支撑点结构，实现了波带片结构自支撑，提高了大高宽比波带片的稳定性。将利用该工艺制作的波带片在北京同步辐射装置X射线成像4W1A束线8 keV能量下进行了聚焦测试，得到清晰的聚焦结果。

Abstract

The high-resolution hard X-ray (

2 keV) Fresnel zone plates with high density and high aspect ratio was fabricated for Synchrotron Radiation Light Source. The electron beam lithography and the fabrication of hard X-ray zone plates were simulated with Monte Carlo method by combining high accelerating voltage (100 kV) with Si

self-standing film to reduce the backscattering. The simulation result shows that Si

self-standing film substrate effectively reduces backscattering when electrons propagate in the resist

so that the structure collapse and adhesion caused by high density and high aspect ratio are overcome. By adjusting the electron beam exposure dose

hard X-ray Fresnel zone plates with the outermost ring width of 150 nm

gold absorber thickness of 1.6 μm and the aspect ratio more than 10 were fabricated on a 500 nm Si

self-standing film. Meanwhile

a random support structure was introduced to realize the self support of the zone plates and to improve their stability. The focusing properties of the zone plates fabricated were tested with energy of 8 keV at 4W1A beamline of Beijing Synchrotron Radiation Facility

and a clear focusing result was obtained.

关键词

Keywords

references

WU H R, CHEN S T, CHU Y S, et al.. Nanoresolution radiology of neurons[J]. Journal of Physics D:Applied Physics, 2012, 45(24):242001.

徐向东, 周洪军, 洪义麟, 等.软X射线直线单色仪光场分布实验研究[J].物理学报, 2000, 49(6):1043-1046.

XU X D, ZHOU H J, Hong Y L, et al.. Experimental study on optical field distribution of the soft X-ray linear monochromator[J]. Acta Physica Sinica, 2000, 49(6):1043-1046. (in Chinese)

MESLER B L, FISCHER P, CHAO W L, et al.. Soft X-ray imaging of spin dynamics at high spatial and temporal resolution[J]. Journal of Vacuum Science & Technology B:Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2007, 25(6):2598-2602.

ATTWOOD D. Soft X-rays and Extreme Ultraviolet Radiation:Principles and Applications[M]. Cambridge:Cambridge University Press, 1999.

FENG Y, FESER M, LYON A, et al.. Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications[J]. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics:Materials, Processing, Measurement, and Phenomena, 2007, 25(6):2004-2007.

CHEN Y T, LO T N, CHIU C W, et al.. Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating[J]. Journal of Synchrotron Radiation, 2008, 15(2):170-175.

CHU Y S, YI J M, DE CARLO F, et al.. Hard-X-ray microscopy with Fresnel zone plates reaches 40 nm Rayleigh resolution[J]. Applied Physics Letters, 2008, 92(10):103119.

CHEN Y T, LO T N, CHU Y S, et al.. Full-field hard X-ray microscopy below 30 nm:A challenging nanofabrication achievement[J]. Nanotechnology, 2008, 19(39):395302.

HOLMBERG A, REINSPACH J, LINDBLOM M, et al.. Towards 10-nm soft X-ray zone plate fabrication[J]. AIP Conference Proceedings, 2011, 1365(1):18-23.

REINSPACH J, LINDBLOM M, HOFSTEN O V, et al.. Process development for improved soft X-ray zone plates[J]. Microelectronic Engineering, 2010, 87(5-8):1583-1586.

CHUBAROVA E, NILSSON D, LINDBLOM M, et al.. Platinum zone plates for hard X-ray applications[J]. Microelectronic Engineering, 2011, 88(10):3123-3126.

KOYAMA T, TAKANO H, KONISHI S, et al.. Circular multilayer zone plate for high-energy X-ray nano-imaging[J]. Review of Scientific Instruments, 2012, 83(1):013705.

YIN G CH, SONG Y F, TANG M T, et al.. 30 nm resolution x-ray imaging at 8 keV using third order diffraction of a zone plate lens objective in a transmission microscope[J]. Applied Physics Letters, 2006, 89(22):221122.

GORELICK S, VILA-COMAMALA J, GUZENKO V A, et al.. High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating[J]. Journal of Synchrotron Radiation, 2011, 18(3):442-446.

WERNER S, REHBEIN S, GUTTMANN P, et al.. Towards high diffraction efficiency zone plates for X-ray microscopy[J]. Microelectronic Engineering, 2010, 87(5-8):1557-1560.

KAGOSHIMA Y, TAKANO H, KOYAMA T, et al.. Tandem-phase zone-plate optics for high-energy X-ray focusing[J]. Japanese Journal of Applied Physics, 2011, 50(2R):022503.

BERUJON S, WANG H, PAPE I, et al.. X-ray submicrometer phase contrast imaging with a Fresnel zone plate and a two dimensional grating interferometer[J]. Optics Letters, 2012, 37(10):1622-1624.

NILSSON D, UHLÉN F, REINSPACH J, et al.. Thermal stability of tungsten zone plates for focusing hard X-ray free-electron laser radiation[J]. New Journal of Physics, 2012, 14(4):043010.

KUWABARA H, YASHIRO W, HARASSE S, et al.. Hard-X-ray phase-difference microscopy with a low-brilliance laboratory X-ray source[J]. Applied Physics Express, 2011, 4(6):062502.

UHLÉN F, LINDQVIST S, NILSSON D, et al.. New diamond nanofabrication process for hard X-ray zone plates[J]. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics:Materials, Processing, Measurement, and Phenomena, 2011, 29(6):06FG03.

DAVID C, GORELICK S, RUTISHAUSER S, et al.. Nanofocusing of hard x-ray free electron laser pulses using diamond based Fresnel zone plates[J]. Scientific Reports, 2011, 1:57.

WOJCIK M J, JOSHI V, SUMANT A V, et al.. Nanofabrication of X-ray zone plates using ultrananocrystalline diamond molds and electroforming[J]. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics:Materials, Processing, Measurement, and Phenomena, 2010, 28(6):C6P30.

SARKAR S S, SOLAK H H, RAABE J, et al.. Fabrication of Fresnel zone plates with 25 nm zone width using extreme ultraviolet holography[J]. Microelectronic Engineering, 2010, 87(5-8):854-858.

CHAO W, FISCHER P, TYLISZCZAK T, et al.. Real space soft X-ray imaging at 10 nm spatial resolution[J]. Optics Express, 2012, 20(9):9777-9783.

REHBEIN S, GUTTMANN P, WERNER S, et al.. Characterization of the resolving power and contrast transfer function of a transmission X-ray microscope with partially coherent illumination[J]. Optics Express, 2012, 20(6):5830-5839.

柳龙华, 刘刚, 熊瑛, 等.大高宽比、高线密度X射线透射光栅的制作[J].光学精密工程, 2009, 17(1):72-77.

LIU L H, LIU G, XIONG Y, et al.. Fabrication of high-aspect-ratio and high-density X-ray transmission grating[J]. Opt. Precision Eng., 2009, 17(1):72-77. (in Chinese)

肖凯, 刘颖, 付绍军.振幅矢量叠加法分析X射线波带片加工误差对效率的影响[J].光学精密工程, 2005, 13(6):643-649.

XIAO K, LIU Y, FU SH J. Analysis of the influence of fabrication errors on the efficiency of X-ray zone plates by summing up the wavelets[J]. Opt. Precision Eng., 2005, 13(6):643-649. (in Chinese)

陈洁, 柳龙华, 刘刚, 等. X射线成像波带片及制作[J].光学精密工程, 2007, 15(12):1894-1899.

CHEN J, LIU L H, LIU G, et al.. X-ray imaging Fresnel zone plates and fabrication[J]. Opt. Precision Eng., 2007, 15(12):1894-1899. (in Chinese)

XIE CH Q, ZHU X L, SHI L N, et al.. Spiral photon sieves apodized by digital prolate spheroidal window for the generation of hard-X-ray vortex[J]. Optics Letters, 2010, 35(11):1765-1767.

XIE CH Q, ZHU X L, LI H L, et al.. Feasibility study of hard-X-ray nanofocusing above 20 keV using compound photon sieves[J]. Optics Letters, 2010, 35(23):4048-4050.

谢常青, 朱效立, 牛洁斌, 等.微纳金属光学结构制备技术及应用[J].光学学报, 2011, 31(9):0900128.

XIE CH Q, ZHU X L, NIU J B, et al.. Micro-and-nano-metal structures fabrication technology and applications[J]. Acta Optica Sinica, 2011, 31(9):0900128. (in Chinese)

KIRZ J. Phase zone plates for X rays and the extreme UV[J]. Journal of the Optical Society of America, 1974, 64(3):301-309.

浏览量

513

下载量

CSCD

文章被引用时，请邮件提醒。

提交

工具集

关联资源

电子束直写大深宽比Si₃N₄薄膜支撑的光栅X射线准直器

X射线衍射光学部件的制备及其光学性能表征

应用微波技术抑制光刻胶图形的坍塌与黏连